High Vacuum Sputtering System Sistema de Polvorització Catòdica al Buit by Yang Yang is a highly esteemed winner of the very prestigious 2021 A' Design Award de Bronze in Disseny de Maquinària de Fabricació i Processament Competition Category.
BronzeMaquinària· 2021
High Vacuum Sputtering System Sistema de Polvorització Catòdica al Buit
by Yang Yang
Client: Huaiyin Institute of Technology & Liaoning Petrochemical University
A' Design Award de Bronze Winner in Maquinària Category
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- Verified Award Winner
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The Design
About High Vacuum Sputtering System Sistema de Polvorització Catòdica al Buit
El Sistema de Polvorització Catòdica d'Alt Buit és una màquina que diposita capes primes metàl·liques i dielèctriques sobre substrats de fins a 300 mil·límetres. El sistema utilitza fonts de polvorització per magnetró alimentades per radiofreqüència, corrent continu o corrent continu polsat, treballant en mode individual o en mode de co-deposició. Una estructura modular permet una instal·lació, transport i manteniment senzills. La carcassa està fabricada en acer laminat en fred amb conformat de xapa metàl·lica i acabat a l'esprai, un bastidor interior d'alumini i una coberta acrílica translúcida de color gris. La pantalla de control segueix principis ergonòmics.
The Recognition
About the A' Design Award de Bronze
High Vacuum Sputtering System Sistema de Polvorització Catòdica al Buit és un guanyador del guardó A' Design Award de Bronze, un reconeixement altament prestigiós concedit a dissenys sobresortints que es distingeixen per la creativitat, l'enginy i l'astúcia. Els guanyadors de Bronze són artefactes ampliament hàbils i sorprenentment creatius que autentiquen la vasta experiència, la imaginació i el recurs dels seus dissenyadors. Es preveu que High Vacuum Sputtering System Sistema de Polvorització Catòdica al Buit sigui un objecte molt apreciat, admirat i estimat, notablement professional i innovador. Aquest disseny guanyador del guardó A' Design Award de Bronze incorpora les millors pràctiques de l'art, la ciència, el disseny i la tecnologia i és excel·lent per la seva atenció al detall. High Vacuum Sputtering System Sistema de Polvorització Catòdica al Buit satisfà esplèndidament les necessitats, toca els desitjos, encisa els sentiments i crida la curiositat.
Behind the Design
Press Kit
Credits, team members and technical details provided by the designer.
- Unique Properties
- This Ultra High Vacuum Sputtering System subverts the traditional model. On the basis of the functional machine, it integrates many factors for industrial design according to the requirements of the users and the environments. This system mainly adopts modular combination mode, which is convenient for combined installation, transportation and maintenance.The overall shape design is neat and beautiful, the surface treatment is fine, the fuselage is matched with the translucent acrylic mask in gray tone, giving people a simple, modern and beautiful feeling. Ergonomics and interactions are reflected in the design of the control screen.
- Dimensions & Packaging
- Width 2800mm x Depth 1200mm x Height 1500mm
- Tags
- Vacuum magnetron sputtering, UHV SPUTTER，Large equipment
- Production Technology
- The main material of the shell is high quality cold plate, which uses sheet metal forming process and environmental protection spray technology, internal skeleton for aluminum, mask for acrylic material. The fuselage design adopts screen printing process.
- Design Challenge
- The most difficult part of this design exercise is the matching relationship between the whole system, the operating mode, ergonomic design, and the interaction design in the control system.
- Research
- On the market，this kind of products are mainly functional machines, lack of ergonomic design. The surface treatment and texture of material are rough, the modelling lack modern design sense. The Ultra High Voltage Sputter System is a school-enterprise cooperation project completed by designers and engineers jointly. This is an improved product design based on the university's scientific research background and technical conditions of the update and improvement.
- Inspiration
- The Ultra High Vacuum Sputtering System is used in world-famous research laboratories of superconducting and quantum devices. The market is dominated by functional machines with bare devices and circuits, which don’t match the modern and intelligent test environment. Therefore, the integrated design of the system should be carried out to ensure the overall beautiful appearance design, in line with the ergonomic control design and the innovative design of human-computer interaction.
- Project Duration
- The project began in January 2020 in Huai 'an, Jiangsu Province, China, and ended in November 2020 in Huai 'an, Jiangsu Province, China.
- Operation Flow
- Ultra High Vacuum Sputtering System can deposit metal and dielectric thin films on substrates up to 300mm. Magnetron sputtering sources using RF, DC, or pulsed DC power sources can operate in single mode or co-deposition mode to produce films that meet a wide range of requirements.
- Team Members
- Yang Yang
Lei Wang
Menghua Wang
Chi Rui
Yu Jiang
Shuchang Cui
Zhe Li - Image Credits
- Image #1: Photographer Yang Yang, Variations, 2020.
Image #2: Photographer Lei Wang, Variations, 2020.
Image #3: Photographer Menghua Wang, Variations, 2020.
Image #4: Photographer Lei Wang, Variations, 2020.
Image #5: Photographer Lei Wang, Variations, 2020.
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