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High Vacuum Sputtering System Vakuum Sputtersystem by Yang Yang

High Vacuum Sputtering System Vakuum Sputtersystem by Yang Yang is a highly esteemed winner of the very prestigious 2021 A' Design Award i Bronze in Produktions- og Forarbejdningsmaskiner Design Competition Category.


BronzeMaskiner· 2021

High Vacuum Sputtering System Vakuum Sputtersystem

by Yang Yang

Client: Huaiyin Institute of Technology & Liaoning Petrochemical University

A' Design Award i Bronze Winner in Maskiner Category

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The Design

About High Vacuum Sputtering System Vakuum Sputtersystem

Højvakuum Sputtersystem er en maskine, der deponerer tynde film af metal og dielektriske materialer på substrater op til 300 millimeter. Systemet anvender magnetron-sputterkilder, der drives af radiofrekvens, jævnstrøm eller pulserende jævnstrøm, og kan arbejde i enkelt tilstand eller co-deponeringstilstand. En modulær struktur muliggør enkel installation, transport og vedligeholdelse. Kabinettet er fremstillet af koldvalset stål med formet metalplade og sprøjtelakeret finish, en indre ramme af aluminium og et gennemskinneligt gråt låg af akryl. Kontrolskærmen følger ergonomiske principper.

The Recognition

About the A' Design Award i Bronze

High Vacuum Sputtering System Vakuum Sputtersystem er vinder af A' Design Award i Bronze, en højt prestigefyldt anerkendelse, der tildeles enestående designs, som udmærker sig ved kreativitet, opfindsomhed og skarpsindighed. Bronzevinderne er rigeligt dygtige og påfaldende kreative artefakter, der bekræfter deres designeres store erfaring, fantasi og snilde. High Vacuum Sputtering System Vakuum Sputtersystem forventes at være en højt estimeret, beundret og kær genstand, der er bemærkelsesværdigt professionel og innovativ. Dette design, der har vundet A' Design Award i Bronze, indarbejder bedste praksis inden for kunst, videnskab, design og teknologi og er fremragende på grund af sin sans for detaljer. High Vacuum Sputtering System Vakuum Sputtersystem tilfredsstiller pragtfuldt behov, rører længsler, charmerer følelser og appellerer til nysgerrigheden.

Behind the Design

Press Kit

Credits, team members and technical details provided by the designer.

Unique Properties
This Ultra High Vacuum Sputtering System subverts the traditional model. On the basis of the functional machine, it integrates many factors for industrial design according to the requirements of the users and the environments. This system mainly adopts modular combination mode, which is convenient for combined installation, transportation and maintenance.The overall shape design is neat and beautiful, the surface treatment is fine, the fuselage is matched with the translucent acrylic mask in gray tone, giving people a simple, modern and beautiful feeling. Ergonomics and interactions are reflected in the design of the control screen.
Dimensions & Packaging
Width 2800mm x Depth 1200mm x Height 1500mm
Tags
Vacuum magnetron sputtering, UHV SPUTTER,Large equipment
Production Technology
The main material of the shell is high quality cold plate, which uses sheet metal forming process and environmental protection spray technology, internal skeleton for aluminum, mask for acrylic material. The fuselage design adopts screen printing process.
Design Challenge
The most difficult part of this design exercise is the matching relationship between the whole system, the operating mode, ergonomic design, and the interaction design in the control system.
Research
On the market,this kind of products are mainly functional machines, lack of ergonomic design. The surface treatment and texture of material are rough, the modelling lack modern design sense. The Ultra High Voltage Sputter System is a school-enterprise cooperation project completed by designers and engineers jointly. This is an improved product design based on the university's scientific research background and technical conditions of the update and improvement.
Inspiration
The Ultra High Vacuum Sputtering System is used in world-famous research laboratories of superconducting and quantum devices. The market is dominated by functional machines with bare devices and circuits, which don’t match the modern and intelligent test environment. Therefore, the integrated design of the system should be carried out to ensure the overall beautiful appearance design, in line with the ergonomic control design and the innovative design of human-computer interaction.
Project Duration
The project began in January 2020 in Huai 'an, Jiangsu Province, China, and ended in November 2020 in Huai 'an, Jiangsu Province, China.
Operation Flow
Ultra High Vacuum Sputtering System can deposit metal and dielectric thin films on substrates up to 300mm. Magnetron sputtering sources using RF, DC, or pulsed DC power sources can operate in single mode or co-deposition mode to produce films that meet a wide range of requirements.
Team Members
Yang Yang
Lei Wang
Menghua Wang
Chi Rui
Yu Jiang
Shuchang Cui
Zhe Li
Image Credits
Image #1: Photographer Yang Yang, Variations, 2020.
Image #2: Photographer Lei Wang, Variations, 2020.
Image #3: Photographer Menghua Wang, Variations, 2020.
Image #4: Photographer Lei Wang, Variations, 2020.
Image #5: Photographer Lei Wang, Variations, 2020.

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