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High Vacuum Sputtering System Vakuum-Sputteranlage by Yang Yang

High Vacuum Sputtering System Vakuum-Sputteranlage by Yang Yang is a highly esteemed winner of the very prestigious 2021 A' Design Award in Bronze in Maschinendesign Competition Category.


BronzeMaschine· 2021

High Vacuum Sputtering System Vakuum-Sputteranlage

by Yang Yang

Client: Huaiyin Institute of Technology & Liaoning Petrochemical University

A' Design Award in Bronze Winner in Maschine Category

Colors

The Design

About High Vacuum Sputtering System Vakuum-Sputteranlage

Die Hochvakuum-Sputteranlage ist eine Maschine, die metallische und dielektrische Dünnschichten auf Substrate mit einem Durchmesser von bis zu 300 Millimetern abscheidet. Das System nutzt Magnetron-Sputterquellen, die mit Hochfrequenz, Gleichstrom oder gepulstem Gleichstrom betrieben werden und im Einzelbetrieb oder im Co-Deposition-Modus arbeiten. Ein modularer Aufbau ermöglicht eine einfache Installation, einen unkomplizierten Transport und eine wartungsfreundliche Handhabung. Das Gehäuse besteht aus kaltgewalztem Stahl mit Blechumformung und Spritzlackierung, einem inneren Aluminiumrahmen sowie einer transluzenten grauen Acrylabdeckung. Der Steuerbildschirm folgt ergonomischen Prinzipien.

The Recognition

About the A' Design Award in Bronze

High Vacuum Sputtering System Vakuum-Sputteranlage ist Gewinner des A' Design Award in Bronze, einer hochprestigeträchtigen Anerkennung für herausragende Designs, die sich durch Kreativität, Einfallsreichtum und Scharfsinn auszeichnen. Bronze-Gewinner sind reichlich geschickte und auffallend kreative Artefakte, die die große Erfahrung, Fantasie und Findigkeit ihrer Designer belegen. Von High Vacuum Sputtering System Vakuum-Sputteranlage wird erwartet, dass es ein hochgeschätztes, bewundertes und geliebtes Objekt ist, das bemerkenswert professionell und innovativ ist. Dieses mit dem A' Design Award in Bronze prämierte Design verkörpert bewährte Verfahren in Kunst, Wissenschaft, Design und Technologie und ist hervorragend in seiner Liebe zum Detail. High Vacuum Sputtering System Vakuum-Sputteranlage befriedigt Bedürfnisse auf großartige Weise, berührt Wünsche, bezaubert Gefühle und spricht die Neugier an.

Behind the Design

Press Kit

Credits, team members and technical details provided by the designer.

Unique Properties
This Ultra High Vacuum Sputtering System subverts the traditional model. On the basis of the functional machine, it integrates many factors for industrial design according to the requirements of the users and the environments. This system mainly adopts modular combination mode, which is convenient for combined installation, transportation and maintenance.The overall shape design is neat and beautiful, the surface treatment is fine, the fuselage is matched with the translucent acrylic mask in gray tone, giving people a simple, modern and beautiful feeling. Ergonomics and interactions are reflected in the design of the control screen.
Dimensions & Packaging
Width 2800mm x Depth 1200mm x Height 1500mm
Tags
Vacuum magnetron sputtering, UHV SPUTTER,Large equipment
Production Technology
The main material of the shell is high quality cold plate, which uses sheet metal forming process and environmental protection spray technology, internal skeleton for aluminum, mask for acrylic material. The fuselage design adopts screen printing process.
Design Challenge
The most difficult part of this design exercise is the matching relationship between the whole system, the operating mode, ergonomic design, and the interaction design in the control system.
Research
On the market,this kind of products are mainly functional machines, lack of ergonomic design. The surface treatment and texture of material are rough, the modelling lack modern design sense. The Ultra High Voltage Sputter System is a school-enterprise cooperation project completed by designers and engineers jointly. This is an improved product design based on the university's scientific research background and technical conditions of the update and improvement.
Inspiration
The Ultra High Vacuum Sputtering System is used in world-famous research laboratories of superconducting and quantum devices. The market is dominated by functional machines with bare devices and circuits, which don’t match the modern and intelligent test environment. Therefore, the integrated design of the system should be carried out to ensure the overall beautiful appearance design, in line with the ergonomic control design and the innovative design of human-computer interaction.
Project Duration
The project began in January 2020 in Huai 'an, Jiangsu Province, China, and ended in November 2020 in Huai 'an, Jiangsu Province, China.
Operation Flow
Ultra High Vacuum Sputtering System can deposit metal and dielectric thin films on substrates up to 300mm. Magnetron sputtering sources using RF, DC, or pulsed DC power sources can operate in single mode or co-deposition mode to produce films that meet a wide range of requirements.
Team Members
Yang Yang
Lei Wang
Menghua Wang
Chi Rui
Yu Jiang
Shuchang Cui
Zhe Li
Image Credits
Image #1: Photographer Yang Yang, Variations, 2020.
Image #2: Photographer Lei Wang, Variations, 2020.
Image #3: Photographer Menghua Wang, Variations, 2020.
Image #4: Photographer Lei Wang, Variations, 2020.
Image #5: Photographer Lei Wang, Variations, 2020.

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