High Vacuum Sputtering System Altvakua Ŝpruca Sistemo by Yang Yang

High Vacuum Sputtering System Altvakua Ŝpruca Sistemo by Yang Yang is a highly esteemed winner of the very prestigious 2021 Bronza A' Design Award in Dezajno de Fabrikaj kaj Pretigaj Maŝinoj Competition Category.

BronzoMaŝinaro· 2021

High Vacuum Sputtering System Altvakua Ŝpruca Sistemo

by Yang Yang

Client: Huaiyin Institute of Technology & Liaoning Petrochemical University

Bronza A' Design Award Winner in Maŝinaro Category

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Verified Award Winner

Verify Award Status for #115788

View at A' Design Award Press Release Award Badge

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The Design

About High Vacuum Sputtering System Altvakua Ŝpruca Sistemo

Alta Vakua Ŝpruca Sistemo estas maŝino kiu deponas metalajn kaj dielektrikajn maldikajn tavolojn sur substratoj ĝis 300 milimetroj. La sistemo uzas magnetronajn ŝprucfontojn funkciigatajn per radiofrekvenco, kontinua kurento aŭ pulsa kontinua kurento, funkciante en unuopa reĝimo aŭ en kundeponada reĝimo. Modula strukturo ebligas simplan instalon, transporton kaj prizorgadon. La ĉirkaŭaĵo estas farita el malvarme-volvita ŝtalo per lada formado kaj ŝprucfinado, kun interna kadro el aluminio kaj travidebla griza akrila kovrilo. La kontrolekrano sekvas ergonomiajn principojn.

The Recognition

About the Bronza A' Design Award

High Vacuum Sputtering System Altvakua Ŝpruca Sistemo estas gajninto de la Bronza A' Design Award, tre prestiĝa rekono donata al elstaraj dezajnoj distingitaj per kreemo, ingenieco kaj sagaco. La Bronzaj gajnintoj estas abunde lertaj kaj frape kreemaj artefaktoj, kiuj aŭtentikigas la vastan sperton, imagpovon kaj elturniĝemon de siaj dezajnistoj. Oni atendas, ke High Vacuum Sputtering System Altvakua Ŝpruca Sistemo estu tre estimata, admirata kaj ŝatata objekto, kiu estas rimarkinde profesia kaj nova. Ĉi tiu dezajno gajninta la Bronzan A' Design Award enkorpigas plej bonajn praktikojn en arto, scienco, dezajno kaj teknologio, kaj estas bonega pro sia atento al detaloj. High Vacuum Sputtering System Altvakua Ŝpruca Sistemo bonege kontentigas bezonojn, tuŝas dezirojn, ĉarmas sentojn kaj allogas scivolemon.

Behind the Design

Press Kit

Credits, team members and technical details provided by the designer.

Unique Properties: This Ultra High Vacuum Sputtering System subverts the traditional model. On the basis of the functional machine, it integrates many factors for industrial design according to the requirements of the users and the environments. This system mainly adopts modular combination mode, which is convenient for combined installation, transportation and maintenance.The overall shape design is neat and beautiful, the surface treatment is fine, the fuselage is matched with the translucent acrylic mask in gray tone, giving people a simple, modern and beautiful feeling. Ergonomics and interactions are reflected in the design of the control screen.
Dimensions & Packaging: Width 2800mm x Depth 1200mm x Height 1500mm
Tags: Vacuum magnetron sputtering, UHV SPUTTER，Large equipment
Production Technology: The main material of the shell is high quality cold plate, which uses sheet metal forming process and environmental protection spray technology, internal skeleton for aluminum, mask for acrylic material. The fuselage design adopts screen printing process.
Design Challenge: The most difficult part of this design exercise is the matching relationship between the whole system, the operating mode, ergonomic design, and the interaction design in the control system.
Research: On the market，this kind of products are mainly functional machines, lack of ergonomic design. The surface treatment and texture of material are rough, the modelling lack modern design sense. The Ultra High Voltage Sputter System is a school-enterprise cooperation project completed by designers and engineers jointly. This is an improved product design based on the university's scientific research background and technical conditions of the update and improvement.
Inspiration: The Ultra High Vacuum Sputtering System is used in world-famous research laboratories of superconducting and quantum devices. The market is dominated by functional machines with bare devices and circuits, which don’t match the modern and intelligent test environment. Therefore, the integrated design of the system should be carried out to ensure the overall beautiful appearance design, in line with the ergonomic control design and the innovative design of human-computer interaction.
Project Duration: The project began in January 2020 in Huai 'an, Jiangsu Province, China, and ended in November 2020 in Huai 'an, Jiangsu Province, China.
Operation Flow: Ultra High Vacuum Sputtering System can deposit metal and dielectric thin films on substrates up to 300mm. Magnetron sputtering sources using RF, DC, or pulsed DC power sources can operate in single mode or co-deposition mode to produce films that meet a wide range of requirements.
Team Members: Yang Yang
Lei Wang
Menghua Wang
Chi Rui
Yu Jiang
Shuchang Cui
Zhe Li
Image Credits: Image #1: Photographer Yang Yang, Variations, 2020.
Image #2: Photographer Lei Wang, Variations, 2020.
Image #3: Photographer Menghua Wang, Variations, 2020.
Image #4: Photographer Lei Wang, Variations, 2020.
Image #5: Photographer Lei Wang, Variations, 2020.