Bronce Maquinaria · 2021
High Vacuum Sputtering System Sistema de pulverización catódica al vacío
by Yang Yang
- A' Design Award de Bronce 2021 in Maquinaria
- CLIENT: Huaiyin Institute of Technology & Liaoning Petrochemical University
- Estimated Number of Design Views: 73,086
- Verification code EA39666576 · Verify this award
Colors
About High Vacuum Sputtering System Sistema de pulverización catódica al vacío
El Sistema de Pulverización Catódica de Alto Vacío es una máquina que deposita películas delgadas metálicas y dieléctricas sobre sustratos de hasta 300 milímetros. El sistema emplea fuentes de pulverización catódica por magnetrón alimentadas por radiofrecuencia, corriente continua o corriente continua pulsada, que funcionan en modo individual o en modo de codeposición. Una estructura modular permite una instalación, un transporte y un mantenimiento sencillos. La carcasa está fabricada en acero laminado en frío con conformado de chapa metálica y acabado por pulverización, un bastidor interior de aluminio y una cubierta acrílica gris translúcida. La pantalla de control sigue principios ergonómicos.
About the A' Design Award de Bronce
High Vacuum Sputtering System Sistema de pulverización catódica al vacío ha ganado el A' Design Award de Bronce, un reconocimiento sumamente prestigioso concedido a diseños sobresalientes que se distinguen por su creatividad, ingenio y astucia. Los ganadores de Bronce son artefactos ampliamente hábiles y sorprendentemente creativos que acreditan la vasta experiencia, imaginación e ingeniosidad de sus diseñadores. Se espera que High Vacuum Sputtering System Sistema de pulverización catódica al vacío sea un objeto muy apreciado, admirado y querido, notablemente profesional e innovador. Este diseño ganador del A' Design Award de Bronce incorpora las mejores prácticas del arte, la ciencia, el diseño y la tecnología, y es excelente por su atención al detalle. High Vacuum Sputtering System Sistema de pulverización catódica al vacío satisface espléndidamente las necesidades, toca los deseos, encanta los sentimientos y atrae la curiosidad.
Press Kit
- Unique Properties
- This Ultra High Vacuum Sputtering System subverts the traditional model. On the basis of the functional machine, it integrates many factors for industrial design according to the requirements of the users and the environments. This system mainly adopts modular combination mode, which is convenient for combined installation, transportation and maintenance.The overall shape design is neat and beautiful, the surface treatment is fine, the fuselage is matched with the translucent acrylic mask in gray tone, giving people a simple, modern and beautiful feeling. Ergonomics and interactions are reflected in the design of the control screen.
- Dimensions & Packaging
- Width 2800mm x Depth 1200mm x Height 1500mm
- Tags
- Vacuum magnetron sputtering, UHV SPUTTER，Large equipment
- Production Technology
- The main material of the shell is high quality cold plate, which uses sheet metal forming process and environmental protection spray technology, internal skeleton for aluminum, mask for acrylic material. The fuselage design adopts screen printing process.
- Design Challenge
- The most difficult part of this design exercise is the matching relationship between the whole system, the operating mode, ergonomic design, and the interaction design in the control system.
- Research
- On the market，this kind of products are mainly functional machines, lack of ergonomic design. The surface treatment and texture of material are rough, the modelling lack modern design sense. The Ultra High Voltage Sputter System is a school-enterprise cooperation project completed by designers and engineers jointly. This is an improved product design based on the university's scientific research background and technical conditions of the update and improvement.
- Inspiration
- The Ultra High Vacuum Sputtering System is used in world-famous research laboratories of superconducting and quantum devices. The market is dominated by functional machines with bare devices and circuits, which don’t match the modern and intelligent test environment. Therefore, the integrated design of the system should be carried out to ensure the overall beautiful appearance design, in line with the ergonomic control design and the innovative design of human-computer interaction.
- Project Duration
- The project began in January 2020 in Huai 'an, Jiangsu Province, China, and ended in November 2020 in Huai 'an, Jiangsu Province, China.
- Operation Flow
- Ultra High Vacuum Sputtering System can deposit metal and dielectric thin films on substrates up to 300mm. Magnetron sputtering sources using RF, DC, or pulsed DC power sources can operate in single mode or co-deposition mode to produce films that meet a wide range of requirements.
- Image Credits
- Image #1: Photographer Yang Yang, Variations, 2020.
Image #2: Photographer Lei Wang, Variations, 2020.
Image #3: Photographer Menghua Wang, Variations, 2020.
Image #4: Photographer Lei Wang, Variations, 2020.
Image #5: Photographer Lei Wang, Variations, 2020.
