High Vacuum Sputtering System سامانه پاشش کاتدی خلاء بالا

Press Kit

Unique Properties

This Ultra High Vacuum Sputtering System subverts the traditional model. On the basis of the functional machine, it integrates many factors for industrial design according to the requirements of the users and the environments. This system mainly adopts modular combination mode, which is convenient for combined installation, transportation and maintenance.The overall shape design is neat and beautiful, the surface treatment is fine, the fuselage is matched with the translucent acrylic mask in gray tone, giving people a simple, modern and beautiful feeling. Ergonomics and interactions are reflected in the design of the control screen.

Dimensions & Packaging

Width 2800mm x Depth 1200mm x Height 1500mm

Tags

Vacuum magnetron sputtering, UHV SPUTTER，Large equipment

Production Technology

The main material of the shell is high quality cold plate, which uses sheet metal forming process and environmental protection spray technology, internal skeleton for aluminum, mask for acrylic material. The fuselage design adopts screen printing process.

Design Challenge

The most difficult part of this design exercise is the matching relationship between the whole system, the operating mode, ergonomic design, and the interaction design in the control system.

Research

On the market，this kind of products are mainly functional machines, lack of ergonomic design. The surface treatment and texture of material are rough, the modelling lack modern design sense. The Ultra High Voltage Sputter System is a school-enterprise cooperation project completed by designers and engineers jointly. This is an improved product design based on the university's scientific research background and technical conditions of the update and improvement.

Inspiration

The Ultra High Vacuum Sputtering System is used in world-famous research laboratories of superconducting and quantum devices. The market is dominated by functional machines with bare devices and circuits, which don’t match the modern and intelligent test environment. Therefore, the integrated design of the system should be carried out to ensure the overall beautiful appearance design, in line with the ergonomic control design and the innovative design of human-computer interaction.

Project Duration

The project began in January 2020 in Huai 'an, Jiangsu Province, China, and ended in November 2020 in Huai 'an, Jiangsu Province, China.

Operation Flow

Ultra High Vacuum Sputtering System can deposit metal and dielectric thin films on substrates up to 300mm. Magnetron sputtering sources using RF, DC, or pulsed DC power sources can operate in single mode or co-deposition mode to produce films that meet a wide range of requirements.

Image Credits

Image #1: Photographer Yang Yang, Variations, 2020.
Image #2: Photographer Lei Wang, Variations, 2020.
Image #3: Photographer Menghua Wang, Variations, 2020.
Image #4: Photographer Lei Wang, Variations, 2020.
Image #5: Photographer Lei Wang, Variations, 2020.