Culture to Technology Identity Postair le Lei Wang

Tha Culture to Technology Identity Postair le Lei Wang na bhuannaiche air leth urramach anns an fharpais chliùitich 2025 Duais Platanaim A' Design Award ann an Roinn Farpais Dealbhadh Grafaigean, Dealbh-mhìneachaidh agus Conaltradh Lèirsinneach.

PlatanamGrafaig· 2025

Culture to Technology Identity Postair

le Lei Wang

Neach-ceannach: Hefei High Tech Digital Technology Co., LTD.

Buannaiche Duais Platanaim A' Design Award ann an Roinn Grafaig

1,514,114

Buannaiche Duais Dearbhaichte

Dearbhaich Inbhe na Duaise airson #172335

Seall aig A' Design Award Brath Naidheachd Suaicheantas Duaise

Dathan

An Dealbhadh

Mu dheidhinn Culture to Technology Identity Postair

'S e postair a th' ann an Culture to Technology Identity a chaidh a dhealbhadh airson a thaisbeanadh ann am bogsaichean-solais aig stadan bus. Anns a' phàirt àrd, tha an caractar Sìneach airson Anhui air a fhrèamadh le cumaidhean clasaigeach ailtireachd Huizhou, a' toirt gu cuimhne eachdraidh agus cultar na sgìre. Tha an caractar ag atharrachadh mean air mhean gu bhith na chuairt-dealain, a' crìochnachadh anns na ceithir caractaran Sìneach airson Hefei High Tech. Tha am postair 60 le 90 ceudameatairean a mheud. Tha na tuaran gorma caiseadach air an clò-bhualadh le tar-chlò-bhualadh dath-sònraichte, agus tha loidhnichean na cuairt-dealain còmhdaichte le falaid UV ionadail airson buaidh thogte.

An Aithneachadh

Mu dheidhinn Duais Platanaim A' Design Award

Tha Culture to Technology Identity Postair air Duais Platanaim A' Design Award a bhuannachadh, aithneachadh ro-urramach a bheirear do dhealbhaidhean a tha dha-rìribh sònraichte, eireachdail agus iongantach. Tha buannaichean Platanaim nam mìorbhailean cruthachaidh, nam fianais air crìochan cruthachalachd inntleachdail, agus a nochdas proifeiseantachd agus sàr-ghèinidh gun choimeas an luchd-dealbhaidh. Thathar an dùil gum bi na dealbhaidhean seo nan obraichean as ainmeile a mhìnicheas bòidhchead ùine, a chuidicheas le sunnd a' chomainn agus a bhrosnaicheas crìochan ealain, saidheans, dealbhaidh agus teicneolais. Tha Culture to Technology Identity Postair a' nochdadh ìre sàr-mhathais os-chaithreach agus gu cinnteach a' dèanamh an t-saoghail nas fheàrr leis na feartan buannachdail is luachmhor aige. Tha Culture to Technology Identity Postair na obair a bhuannaich Duais Platanaim A' Design Award a dhùisgeas miannan, a bhrosnaicheas, a thaitneas agus a thogas gàirdeachas mòr.

Air Cùl an Dealbhaidh

Pasgan Naidheachd

Creideasan, buill sgioba agus fiosrachadh teicnigeach a chuir an dealbhaiche ri chèile.

Feartan Sònraichte: In the upper section, the Chinese character for Anhui is framed by the classic contours of Huizhou architecture, underlying the profound historical and cultural legacy. This character gradually transforms into a circuit, symbolizing technological advancement, culminating in the four Chinese characters for Hefei High Tech. This progression illustrates the shift from cultural imagery to technological representation, forming the visual centerpiece of the entire composition.
Tomhasan & Pacadh: 60X90cm
Tagaichean: Anhui, Hui Style Architecture, Traditional Culture, Hefei High Tech Zone, Technology, Innovation, History, Future, Convergence
Teicneòlas Cinneasachaidh: The design features high precision drawings at 300dpi. For the bus stop light box, the dimensions are set at 60×90cm, reserving a 3mm bleed and crease for die cutting. The gradient blues utilize spot color overprinting, while circuit lines are enhanced with UV local varnish to create a 3D effect. The production process rigorously ensures color calibration and alignment accuracy to fulfill the requirements for long-term outdoor display.
Dùbhlan Dealbhaidh: Creating a seamless transition between the traditional profiles of Huizhou architecture and modern circuit designs poses a significant challenge for designers. This requires a command in proportion, structural arrangement, and color application. The background features a gradient of blue tones, capturing the essence of Jiangnan, where Huizhou culture thrives, and symbolizing a forward looking perspective filled with endless possibilities in science and technology.
Rannsachadh: In recent years, Anhui has leveraged scientific and technological innovation to drive new quality productivity, achieving remarkable results in sectors such as NEVs, intelligent manufacturing, quantum information, and green energy. This focus on innovation has established science and technology as a new hallmark for Anhui. The Hefei High Tech Zone stands at the forefront of this wave of technological advancement in the region.
Brosnachadh: The advancement of the Hefei High Tech Zone, which facilitates the transition of. Anhui Province from a culturally rich region to a hub of science and innovation, serves as the central theme of this poster. As the capital of Anhui Province, Hefei boasts a rich heritage of Huizhou culture, where traditional Huizhou architecture seamlessly merges with modern technology and innovation, as if it were starting a dialogue that bridges the past and the future, and painting a vibrant scene at their intersection.
Faid a' Phròiseict: The project commenced in Hefei in February 2025 and wrapped up in March 2025, with its application in various scenarios commencing the same month.
Sruth Obrachaidh: The layout design adheres to the principles of simplicity, emphasizing unity and purity. Coupled with the gradient blues that permeate the entire image, it fosters an aesthetic appeal with an oriental influence. The dynamic flow of the circuit lines enhances the visual guidance, encouraging viewers to follow the designated path and delivering an engaging reading experience.
Peutantan: Hefei High Tech Digital Technology Co., LTD.
Buill na Sgioba: Creative Director: Ji Chao
Design Director: Xu Ning
Designers: Jin Lei, Wang Lei
Copywriting planning: Zhou Jiaxiang
Creideasan Dhealbhan: Hefei High Tech Digital Technology Co., LTD.