High Vacuum Sputtering System Vakuuma Izputēšanas Sistēma by Yang Yang

High Vacuum Sputtering System Vakuuma Izputēšanas Sistēma by Yang Yang is a highly esteemed winner of the very prestigious 2021 Bronzas balva A' Design Award in Ražošanas un apstrādes iekārtu dizains Competition Category.

BronzasIekārtas· 2021

High Vacuum Sputtering System Vakuuma Izputēšanas Sistēma

by Yang Yang

Client: Huaiyin Institute of Technology & Liaoning Petrochemical University

Bronzas balva A' Design Award Winner in Iekārtas Category

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View at A' Design Award Press Release Award Badge

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The Design

About High Vacuum Sputtering System Vakuuma Izputēšanas Sistēma

Augstvakuuma izputēšanas sistēma ir iekārta, kas nosēdina metāla un dielektrisko plāno kārtiņu pārklājumus uz pamatnēm līdz 300 milimetriem. Sistēma izmanto magnetrona izputēšanas avotus, ko darbina radiofrekvence, līdzstrāva vai impulsu līdzstrāva, strādājot vienreizējā režīmā vai kopnogulsnēšanas režīmā. Modulāra konstrukcija nodrošina vienkāršu uzstādīšanu, transportēšanu un apkopi. Korpuss ir izgatavots no auksti velmēta tērauda ar loksnes metāla formēšanu un pārklāšanu ar smidzināšanas metodi, alumīnija iekšējo rāmi un caurspīdīgu pelēku akrila pārsegu. Vadības ekrāns izstrādāts atbilstoši ergonomikas principiem.

The Recognition

About the Bronzas balva A' Design Award

High Vacuum Sputtering System Vakuuma Izputēšanas Sistēma ir Bronzas balvas A' Design Award ieguvējs, ļoti prestiža atzinība, ko piešķir izciliem dizainiem, kas izceļas ar radošumu, atjautību un viedumu. Bronzas ieguvēji ir pietiekami prasmīgi un pārsteidzoši radoši darbi, kas apliecina to dizaineru plašo pieredzi, iztēli un izdarību. Sagaidāms, ka High Vacuum Sputtering System Vakuuma Izputēšanas Sistēma būs augsti vērtēts, apbrīnots un cienīts priekšmets, ievērojami profesionāls un inovatīvs. Šis ar Bronzas balvu apbalvotais dizains iekļauj labāko praksi mākslā, zinātnē, dizainā un tehnoloģijās un izceļas ar uzmanību detaļām. High Vacuum Sputtering System Vakuuma Izputēšanas Sistēma lieliski apmierina vajadzības, skar vēlmes, valdzina jūtas un piesaista zinātkāri.

Behind the Design

Press Kit

Credits, team members and technical details provided by the designer.

Unique Properties: This Ultra High Vacuum Sputtering System subverts the traditional model. On the basis of the functional machine, it integrates many factors for industrial design according to the requirements of the users and the environments. This system mainly adopts modular combination mode, which is convenient for combined installation, transportation and maintenance.The overall shape design is neat and beautiful, the surface treatment is fine, the fuselage is matched with the translucent acrylic mask in gray tone, giving people a simple, modern and beautiful feeling. Ergonomics and interactions are reflected in the design of the control screen.
Dimensions & Packaging: Width 2800mm x Depth 1200mm x Height 1500mm
Tags: Vacuum magnetron sputtering, UHV SPUTTER，Large equipment
Production Technology: The main material of the shell is high quality cold plate, which uses sheet metal forming process and environmental protection spray technology, internal skeleton for aluminum, mask for acrylic material. The fuselage design adopts screen printing process.
Design Challenge: The most difficult part of this design exercise is the matching relationship between the whole system, the operating mode, ergonomic design, and the interaction design in the control system.
Research: On the market，this kind of products are mainly functional machines, lack of ergonomic design. The surface treatment and texture of material are rough, the modelling lack modern design sense. The Ultra High Voltage Sputter System is a school-enterprise cooperation project completed by designers and engineers jointly. This is an improved product design based on the university's scientific research background and technical conditions of the update and improvement.
Inspiration: The Ultra High Vacuum Sputtering System is used in world-famous research laboratories of superconducting and quantum devices. The market is dominated by functional machines with bare devices and circuits, which don’t match the modern and intelligent test environment. Therefore, the integrated design of the system should be carried out to ensure the overall beautiful appearance design, in line with the ergonomic control design and the innovative design of human-computer interaction.
Project Duration: The project began in January 2020 in Huai 'an, Jiangsu Province, China, and ended in November 2020 in Huai 'an, Jiangsu Province, China.
Operation Flow: Ultra High Vacuum Sputtering System can deposit metal and dielectric thin films on substrates up to 300mm. Magnetron sputtering sources using RF, DC, or pulsed DC power sources can operate in single mode or co-deposition mode to produce films that meet a wide range of requirements.
Team Members: Yang Yang
Lei Wang
Menghua Wang
Chi Rui
Yu Jiang
Shuchang Cui
Zhe Li
Image Credits: Image #1: Photographer Yang Yang, Variations, 2020.
Image #2: Photographer Lei Wang, Variations, 2020.
Image #3: Photographer Menghua Wang, Variations, 2020.
Image #4: Photographer Lei Wang, Variations, 2020.
Image #5: Photographer Lei Wang, Variations, 2020.