Cetc Research Institute Malo Ochitira Kafukufuku ndi Kuyesa by U a D is a highly esteemed winner of the very prestigious 2023 Mphoto ya Siliva ya A' Design Award in Mapangidwe a Nyumba, Zomanga ndi Zomangidwa Competition Category.
SilivaZomangamanga· 2023
Cetc Research Institute Malo Ochitira Kafukufuku ndi Kuyesa
by U a D
Client: Uad
Mphoto ya Siliva ya A' Design Award Winner in Zomangamanga Category
Verified Award Winner
Verify Award Status for #142336The Design
About Cetc Research Institute Malo Ochitira Kafukufuku ndi Kuyesa
Cetc Research Institute ndi malo ochitira kafukufuku ndi kuyesa omwe ali mu High-tech Zone ya Hefei, m'chigawo cha Anhui, ku China. Nyumbazi zaphatikiza malo a kafukufuku ndi chitukuko, malo oyesera makina, ndi malo osungira uthenga. Nyumbazi zakhazikitsidwa momasuka motsatira magulu a ntchito, kupanga mawonekedwe a malo otsekedwa ndi otseguka. Kakonzedwe ka bwalo lapakati katengera nyumba za mtundu wa Hui zakumaloko, ndipo bwalo lamkati limathandiza kulowa kwa kuwala kwa dzuwa, kuzungulira kwa mpweya ndi kusonkhanitsa madzi amvula. Maferemu a konkire wolimbitsidwa woumbidwa pamalo pomwepo ndiwo mapangidwe aakulu a nyumbazi, pomwe makoma akunja a aluminiyamu ofiira ndi abuluu ndiwo amapanga nkhope za nyumbazi.
The Recognition
About the Mphoto ya Siliva ya A' Design Award
Cetc Research Institute Malo Ochitira Kafukufuku ndi Kuyesa ndi mmodzi mwa opambana a Mphoto ya Siliva ya A' Design Award, kuzindikirika kolemekezeka modabwitsa komwe kumaperekedwa kwa mapangidwe a pamwamba, okongola ndi ochititsa chidwi. Opambana a Siliva ndi ntchito zowala kwambiri ndi zolenga kwambiri zomwe zimaonetsa ukatswiri, luso ndi nzeru zakuthwa za opanga awo. Cetc Research Institute Malo Ochitira Kafukufuku ndi Kuyesa akuyembekezeka kukhala ntchito yodabwitsa yoonetsedwa, yaukatswiri wapadera ndi yatsopano kwambiri. Mapangidwe opambana Mphoto ya Siliva ya A' Design Award awa ndi chopangidwa chodziwika kwambiri ndi choyamikiridwa chomwe chimapindulitsa ndi kukulitsa malire a luso, sayansi, kapangidwe ndi ukadaulo. Cetc Research Institute Malo Ochitira Kafukufuku ndi Kuyesa ndi cholengedwa chomwe anthu ambiri amachichitira nsanje, chomwe chimadzutsa zilakolako, kubweretsa maganizo abwino ndi kuyatsa kudabwa ndi chidwi.
Behind the Design
Press Kit
Credits, team members and technical details provided by the designer.
- Unique Properties
- By drawing inspiration from Chinese traditional village culture, based on the classification standard of relevant industries, buildings are organized in a free way, so as to create various enclosed or open spatial layouts. Similar industries that are mixed can complement each other and also provide a shared platform for high-tech companies, thus promoting industrial agglomeration.
- Dimensions & Packaging
- Project area: 69808 square meters
Type: System Co-design Testing Center - Tags
- Courtyard-style layout, Local Hui-style residential space, Traditional Hui-style architectural culture, China Electronics Technology Group Corporation, The spirit of "harmonious combination"
- Production Technology
- To fulfill requirements for forms and functions, the project employs cast-in-place reinforced concrete frame structure. Roof structure features cross-shaped beams. Anti-seismic joint is set between main buildings and the podium. Above the two-storey podium, there're south and north buildings linked by east and west corridors. The corridors, weakly related with main buildings, adopt steel structure and sliding support. Lecture hall spans 25.2 meters. Rooftop is made from steel-concrete beams.
- Design Challenge
- How to render complex technological R&D and manufacturing process efficient and show humanistic care posed a big challenge. The design team created public facility and activity space to enhance users' sense of belonging and enrich daily activities. Centered on green open space, the project invents a poetic setting for working and production, full of a cultural vibe. Through green technologies, the project forms a modern industrial park, helpful for energy conservation and flexible development.
- Research
- Characteristic contemporary design expressions and traditional spatial charm present the local features, reproduce traditional Hui-style architectural culture, and well interpret rationality of modern technology as well as uplifting spirit of the state-owned enterprise. Incorporating natural elements, the industrial park is characterized by an organic structure and a growing system.
- Inspiration
- Taking cues from local Hui-style residential spaces, the design team adopted the distinctive courtyard-style layout. Interior and outdoor spatial order is subtly fused together, highlighting the spirit of "harmonious combination". The atrium is conducive to daylighting, ventilation and gathering rainwater and generates ecological benefits, just like traditional courtyard in the center. The design reflects the relationship between people and environment, whilst also bringing harmonious spatial experiences as well as a sense of belonging.
- Project Duration
- Project duration: 2014.4.1 - 2017.3.28
Location: Intersection of Xiyou Road and Fangxing Avenue, High-tech Zone, Hefei City, Anhui Province - Operation Flow
- According to the classification standard of relevant industries, buildings are combined freely, so as to form multiple enclosed or open spatial patterns. The main building employs red aluminum curtain walls, while the podium building utilizes blue ones. Combined with glass windows, these two buildings feature rectangular facades. The building cluster is regular and rational, showing characteristics of the industrial park, with a refreshing and elegant visual effect.
- Team Members
- Lu Dan
Feng Xiaohui
Zhao Degong
Yao Min
Zhang Yan
Xia Huangjing
Yuan Shuai
Mao Zhecheng
Lu Yujia
Xu Zhanqing - Image Credits
- ZY Architectural Photography
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